The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2023

Filed:

Nov. 18, 2021
Applicant:

Hua Hong Semiconductor (Wuxi) Limited, Wuxi, CN;

Inventor:

Junwen Liu, Wuxi, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/762 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76205 (2013.01); H01L 29/66825 (2013.01);
Abstract

A method for manufacturing logic device isolation in an embedded storage process, removing the pad silicon nitride and floating gate polysilicon layer in a shallow trench isolation area and retaining the floating gate oxide layer; depositing acid etching silicon nitride; removing the acid etching silicon nitride at the bottom of the shallow trench isolation and a portion of the silicon substrate adjacent to and under the shallow trench isolation, to form a trench and retain the acid etching silicon nitride on a side of the floating gate polysilicon layer close to the shallow trench isolation; remove the acid etching silicon nitride on the side of the floating gate polysilicon layer close to the shallow trench isolation.


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