The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2023

Filed:

Nov. 09, 2018
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Roy Werkman, Eindhoven, NL;

Bijoy Rajasekharan, Eindhoven, NL;

Lydia Marianna Vergaij-Huizer, Eindhoven, NL;

Jochem Sebastiaan Wildenberg, Aarle-Rixtel, NL;

Ronald Van Ittersum, Tilburg, NL;

Pieter Gerardus Jacobus Smorenberg, Rotterdam, NL;

Robertus Wilhelmus Van Der Heijden, Tilburg, NL;

Xiuhong Wei, Eindhoven, NL;

Hadi Yagubizade, Eindhoven, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70458 (2013.01); G03F 7/70616 (2013.01);
Abstract

A method for determining a plurality of corrections for control of at least one manufacturing apparatus used in a manufacturing process for providing product structures to a substrate in a plurality of layers, the method including: determining the plurality of corrections including a correction for each layer, based on an actuation potential of the applicable manufacturing apparatus used in the formation of each layer, wherein the determining includes determining corrections for each layer simultaneously in terms of a matching parameter.


Find Patent Forward Citations

Loading…