The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2023
Filed:
Jan. 19, 2021
Tokyo Electron Limited, Tokyo, JP;
Takayuki Katsunuma, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus includes a plasma chamber that accommodates a substrate having a film including a side wall surface and a bottom surface that define an opening; and a controller that controls a process on the substrate in the plasma chamber. The controller includes a sequencer that performs a sequence including forming a precursor layer on the opening of the film; and generating a plasma to form a protective film on the side wall surface of the opening of the film from the precursor layer and to etch the bottom surface of the opening of the film. The controller simultaneously forms the protective film on the side wall surface of the opening of the film and etches the bottom surface of the opening of the film.