The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2023
Filed:
Jul. 25, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Nicholas Wiswell, Sunnyvale, CA (US);
Chih Chung Chou, San Jose, CA (US);
Dominic J. Benvegnu, La Honda, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 49/12 (2006.01); B24B 37/04 (2012.01); B24B 37/013 (2012.01);
U.S. Cl.
CPC ...
B24B 49/12 (2013.01); B24B 37/013 (2013.01); B24B 37/042 (2013.01);
Abstract
A chemical mechanical polishing system includes a platen to support a polishing pad, a carrier head to hold a substrate and bring a lower surface of the substrate into contact with the polishing pad, and an in-situ friction monitoring system including a friction sensor. The friction sensor includes a pad portion having a substrate contacting portion with an upper surface to contact the lower surface of the substrate, and a pair of capacitive sensors positioned below and on opposing sides of the substrate contacting portion.