The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2023

Filed:

Sep. 13, 2022
Applicant:

Zju-hangzhou Global Scientific and Technological Innovation Center, Zhejiang, CN;

Inventors:

Na Ren, Zhejiang, CN;

Kuang Sheng, Zhejiang, CN;

Zhengyun Zhu, Zhejiang, CN;

Hu Chen, Zhejiang, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7813 (2013.01); H01L 29/0696 (2013.01); H01L 29/4236 (2013.01);
Abstract

A trench-gate power MOSFET with optimized layout, comprising: a substrate; a first semiconductor region formed on the substrate, having a first doping type; mutually separated trench isolation gate structure, formed on the first semiconductor region, the trench isolation gate structure includes an gate oxide layer and a gate electrode; a second semiconductor region and a third semiconductor region formed between any two adjacent structures of mutually separated trench isolation gate structures; and a first shielding region, formed under each of the third semiconductor regions, connecting simultaneously with multiple mutually separated trench isolation structures.


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