The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2023

Filed:

Apr. 06, 2020
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Aaron Berke, Portland, OR (US);

Stephen J. Banik, Portland, OR (US);

Bryan Buckalew, Tualatin, OR (US);

Robert Rash, West Linn, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/288 (2006.01); C25D 7/12 (2006.01); C25D 5/08 (2006.01); C25D 17/00 (2006.01);
U.S. Cl.
CPC ...
C25D 17/001 (2013.01); C25D 5/08 (2013.01); C25D 7/123 (2013.01); C25D 17/004 (2013.01); H01L 21/2885 (2013.01);
Abstract

An apparatus for electroplating a semiconductor wafer includes an insert member configured to circumscribe a processing region. The insert member has a top surface. A portion of the top surface of the insert member has an upward slope that slopes upward from a peripheral area of the top surface of the insert member toward the processing region. The apparatus also includes a seal member having an annular-disk shape. The seal member is positioned on the top surface of the insert member. The seal member is flexible such that an outer radial portion of the seal member conforms to the upward slope of the top surface of the insert member and such that an inner radial portion of the seal member projects inward toward the processing region.


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