The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2023

Filed:

Oct. 26, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Zeqing Shen, San Jose, CA (US);

Bo Qi, San Jose, CA (US);

Abhijit Basu Mallick, Palo Alto, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/505 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C23C 16/045 (2013.01); C23C 16/505 (2013.01); H01L 21/76837 (2013.01);
Abstract

Methods for filling a substrate feature with a carbon gap fill, while leaving a void, are described. Methods comprise flowing a process gas into a high density plasma chemical vapor deposition (HDP-CVD) chamber, the chamber housing a substrate having at least one feature, the process gas comprising a hydrocarbon reactant, generating a plasma, and depositing a carbon film.


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