The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2023
Filed:
Feb. 08, 2022
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Inventors:
Ping-Yuan Chen, Hsinchu, TW;
Hung-Cheng Chen, Hsinchu, TW;
Chih-Hsuan Hsieh, Hsinchu, TW;
Yu-Hsuan Wang, Taoyuan, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); C23C 14/14 (2006.01); C23C 14/06 (2006.01); C23C 14/16 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3464 (2013.01); C23C 14/0641 (2013.01); C23C 14/14 (2013.01); C23C 14/165 (2013.01); C23C 14/3407 (2013.01); C23C 14/352 (2013.01); H01J 37/3417 (2013.01); H01J 37/3429 (2013.01); H01J 37/3435 (2013.01);
Abstract
A sputtering target structure includes a body having a first side and an opposing second side. A first sputtering target is coupled to the first side of the body. The first sputtering target includes a first material. A second sputtering target is coupled to the second side of the body. The second sputtering target includes a second material. A rotation mechanism is coupled to the body and is configured to allow rotation of the body from a first orientation to a second orientation.