The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2023

Filed:

Jun. 23, 2020
Applicant:

Ebara Corporation, Tokyo, JP;

Inventor:

Yuki Watanabe, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 49/05 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); H01L 21/306 (2006.01); B24B 37/005 (2012.01); B24B 49/12 (2006.01); G06F 30/20 (2020.01);
U.S. Cl.
CPC ...
B24B 49/05 (2013.01); B24B 37/005 (2013.01); B24B 49/12 (2013.01); G06F 30/20 (2020.01); H01L 21/30625 (2013.01); H01L 21/67 (2013.01); H01L 22/12 (2013.01); H01L 22/26 (2013.01);
Abstract

A method of automatically determining optimum recipe parameters constituting an operation recipe of an optical film-thickness measuring device within a short period of time is disclosed. The method includes storing in a memory a plurality of parameter sets each including a plurality of recipe parameters constituting an operation recipe; performing simulation of change in film thickness with polishing time with use of the plurality of parameter sets and data of reference spectra of reflected light from a polished substrate, the reference spectra being stored in a data server; inputting at least one index value for evaluating a manner of the change in film thickness into an evaluation calculation formula to calculate a plurality of comprehensive evaluation values for the plurality of parameter sets; and selecting an optimum one of the plurality of parameter sets based on the plurality of comprehensive evaluation values.


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