The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2023
Filed:
Jun. 04, 2021
Synopsys, Inc., Mountain View, CA (US);
Thomas Cecil, Menlo Park, CA (US);
Synopsys, Inc., Sunnyvale, CA (US);
Abstract
Aspects described herein relate to obtaining a mask pattern using a cost function gradient (CFG) generated from a Jacobian matrix generated from a perturbation look-up table (PLT). In an example method, a PLT is populated (). Each table entry of the PLT is based on a respective perturbed intensity signal. The respective perturbed intensity signal is based on a simulated signal received at an image surface using a mask pattern having a perturbed element of the mask pattern. The mask pattern is for a design of an integrated circuit. A matrix is populated () using the PLT and a target intensity signal. The target intensity signal is based on a signal received at the image surface to form target features at the image surface. A CFG is defined () based on the matrix. An analysis is performed () on the mask pattern based on the CFG.