The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2023

Filed:

Mar. 29, 2021
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Andrea Illiberi, Leuven, BE;

Giuseppe Alessio Verni, Antwerp, BE;

Shaoren Deng, Ghent, BE;

Daniele Chiappe, Espoo, FI;

Eva Tois, Helsinki, FI;

Marko Tuominen, Helsinki, FI;

Michael Givens, Oud-Heverlee, BE;

Assignee:

ASM IP HOLDING B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/455 (2006.01); B01J 31/12 (2006.01);
U.S. Cl.
CPC ...
C23C 16/401 (2013.01); B01J 31/122 (2013.01); C23C 16/45534 (2013.01); C23C 16/45553 (2013.01);
Abstract

Methods for selective deposition of silicon oxide films on metal or metallic surfaces relative to dielectric surfaces are provided. A dielectric surface of a substrate may be selectively passivated relative to a metal or metallic surface, such as by exposing the substrate to a silylating agent. Silicon oxide is then selectively deposited on the metal or metallic surface relative to the passivated oxide surface by contacting the metal surface with a metal catalyst and a silicon precursor comprising a silanol.


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