The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2023

Filed:

Apr. 30, 2020
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Troy Alan Gomm, Sherwood, OR (US);

Nick Ray Linebarger, Jr., Beaverton, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); H01L 21/687 (2006.01); C23C 16/458 (2006.01); C23C 16/505 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01); B32B 37/10 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4586 (2013.01); B32B 37/1018 (2013.01); C23C 16/4581 (2013.01); C23C 16/505 (2013.01); C23C 16/52 (2013.01); H01J 37/32577 (2013.01); H01L 21/67103 (2013.01); H01L 21/6831 (2013.01); H01L 21/68757 (2013.01); H01L 21/68785 (2013.01); H01L 21/68792 (2013.01); B32B 2457/00 (2013.01);
Abstract

In various examples, the disclosed subject matter includes a substrate pedestal that includes a platen formed from a ceramic material and having an upper surface to support a substrate during processing. A stem, formed from a ceramic material, has an upper-stem flange upon which the platen is mechanically coupled. The stem has an interior portion. A backside gas-delivery tube, formed from a ceramic material, is located in the interior portion of the stem. The backside gas-delivery tube includes an upper gas-tube flange that is located between a lower surface of the platen and an upper surface of the upper-stem flange. The backside gas-delivery tube is in fluid communication with at least one backside-gas passage of the platen and is arranged to supply a backside gas to a region below a lower surface of the substrate during processing. Other examples of apparatuses and methods of making and using the apparatuses are included.


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