The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2023
Filed:
Jul. 24, 2019
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventor:
Jun Chen, San Jose, CA (US);
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01J 37/28 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G03F 7/705 (2013.01); G03F 7/70525 (2013.01); G03F 7/70616 (2013.01); G03F 7/70641 (2013.01); H01J 37/28 (2013.01); H01L 22/12 (2013.01); H01J 2237/2817 (2013.01);
Abstract
A method for calibrating a process model of a patterning process. The method includes identifying a portion of the substrate that has values within a tolerance band of one or more parameters (e.g., CD, EPE, etc.) of the patterning process, obtaining, via a metrology tool, metrology data corresponding to the portion of the substrate, processing the metrology data, and calibrating a process model based on the processed metrology data.