The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2023

Filed:

Oct. 15, 2020
Applicant:

Advanced Semiconductor Engineering, Inc., Kaohsiung, TW;

Inventors:

Syu-Tang Liu, Kaohsiung, TW;

Huang-Hsien Chang, Kaohsiung, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/538 (2006.01); H01L 23/00 (2006.01); H01L 21/48 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5386 (2013.01); H01L 21/4857 (2013.01); H01L 23/5383 (2013.01); H01L 23/5385 (2013.01); H01L 24/16 (2013.01); H01L 2224/16227 (2013.01);
Abstract

A wiring structure and a method for manufacturing the same are provided. The wiring structure includes a substrate structure, a redistribution structure, an adhesive layer and at least one conductive pillar. The redistribution structure includes at least one dielectric layer. The at least one dielectric layer defines at least one through hole extending through the dielectric layer. The adhesive layer is disposed between the redistribution structure and the substrate structure and bonds the redistribution structure and the substrate structure together. The at least one conductive pillar extends through the redistribution structure and the adhesive layer and is electrically connected to the substrate structure. A portion of the at least one conductive pillar is disposed in the through hole of the at least one dielectric layer.


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