The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2023

Filed:

May. 15, 2020
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Satoshi Suzuki, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/3065 (2006.01); H01L 21/304 (2006.01); H01L 21/677 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01L 21/304 (2013.01); H01L 21/3065 (2013.01); H01L 21/67161 (2013.01); H01L 21/67742 (2013.01); H01L 21/6831 (2013.01);
Abstract

A substrate processing apparatus includes a placing table, having a first placing surface on which a substrate is placed and a rear surface opposite to the first placing surface, provided with a first window which allows the first placing surface and the rear surface to communicate with each other and which is configured to transmit light; a first adjusting device configured to hold a first light irradiation unit configured to irradiate light toward the first window and configured to adjust an irradiation position of the light on the rear surface; and a first reflection member, having retroreflection property, disposed at the rear surface of the placing table to enclose the first window, and configured to reflect a part of the light and return reflection light indicating a deviation between the irradiation position of the light and a position of the first window to the first light irradiation unit.


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