The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2023
Filed:
Apr. 28, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Blake Erickson, Gilroy, CA (US);
Keith Berding, Truckee, CA (US);
Michael Kutney, Santa Clara, CA (US);
Soumendra Barman, San Jose, CA (US);
Zhaozhao Zhu, Milpitas, CA (US);
Michelle SanPedro, Mountain View, CA (US);
Suresh Polali Narayana Rao, Bangalore, IN;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A system includes a memory and at least one processing device operatively coupled to the memory to facilitate an etch recipe development process by performing a number of operations. The operations include receiving a request to initiate an iteration of an etch process using an etch recipe to etch a plurality of materials each located at a respective one of a plurality of reflectometry measurement points, obtaining material thickness data for each of the plurality of materials resulting from the iteration of the etch process, and determining one or more etch parameters based on the material thickness data.