The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2023

Filed:

Jun. 27, 2020
Applicant:

Hexagon Technology Center Gmbh, Heerbrugg, CH;

Inventors:

Thomas Jensen, Rorschach, CH;

Zheng Yang, Friedrichshafen, DE;

Andreas Schwendener, Chur, CH;

Danick Brühlmann, Staad, CH;

Josef Müller, Oberegg, CH;

Johan Stigwall, St. Gallen, CH;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01C 15/00 (2006.01); G02B 5/124 (2006.01); G02B 3/06 (2006.01);
U.S. Cl.
CPC ...
G01C 15/004 (2013.01); G02B 5/124 (2013.01); G02B 3/06 (2013.01);
Abstract

A reflector arrangement for determining the position or marking of target points, having at least one retroreflector, and a beam detection unit, by means of which the orientation measurement radiation passing through the retroreflector is acquirable. The beam detection unit comprises a first sensor for generating a signal in dependence on an acquisition of orientation measurement radiation and a first beam guiding unit. The first sensor and the first beam guiding unit are arranged such that a detection field of view for acquiring the orientation measurement radiation is defined, an alignment of the detection field of view around the yaw axis is variable and orientation measurement radiation passing through the retroreflector is acquirable in dependence on the alignment of the detection field of view with the first sensor.


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