The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2023

Filed:

Jul. 20, 2021
Applicant:

United Semiconductor (Xiamen) Co., Ltd., Fujian, CN;

Inventors:

Rui Ju, Shamen, CN;

Wen Yi Tan, Fujian, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 29/78 (2006.01); H01L 21/8238 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823842 (2013.01); H01L 21/28035 (2013.01); H01L 29/1054 (2013.01); H01L 29/7847 (2013.01);
Abstract

A method of forming semiconductor device is disclosed. A substrate having a logic circuit region and a memory cell region is provided. A first transistor with a first gate is formed in the logic circuit region and a second transistor with a second gate is formed in the memory cell region. A stressor layer is deposited to cover the first transistor in the logic circuit region and the second transistor in the memory cell region. The first transistor and the second transistor are subjected to an annealing process under the influence of the stressor layer to recrystallize the first gate and the second gate.


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