The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2023

Filed:

Dec. 20, 2019
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Violante Moschiano, Bacoli, IT;

Paolo Tessariol, Montebelluna, IT;

Aaron Yip, Los Gatos, CA (US);

Naveen Kaushik, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/522 (2006.01); H01L 23/528 (2006.01); H01L 27/1157 (2017.01); H01L 27/11524 (2017.01); H01L 27/11556 (2017.01); H01L 21/768 (2006.01); H01L 27/11582 (2017.01);
U.S. Cl.
CPC ...
H01L 23/5226 (2013.01); H01L 21/76816 (2013.01); H01L 21/76877 (2013.01); H01L 23/528 (2013.01); H01L 27/1157 (2013.01); H01L 27/11524 (2013.01); H01L 27/11556 (2013.01); H01L 27/11582 (2013.01);
Abstract

Some embodiments include apparatuses and methods of forming the apparatuses. One of the apparatuses includes a first pillar of a first memory cell string; a second pillar of a second memory cell string; a first conductive structure extending in a first direction, the first conductive structure located over and in electrical contact with the first pillar; a second conductive structure extending in the first direction, the second conductive structure located over and in electrical contact with the second pillar; a select gate coupled to the first and second memory cell strings; a first data line located on a first level of the apparatus and extending in a second direction, the first data line located over the first conductive structure and in electrical contact with the first conductive structure; and a second data line located on a second level of the apparatus and extending in the second direction, the second data line located over the second conductive structure and in electrical contact with the second conductive structure.


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