The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2023

Filed:

Jan. 05, 2022
Applicant:

HI Llc, Los Angeles, CA (US);

Inventors:

Micah Ledbetter, Sunnyvale, CA (US);

Benjamin Shapiro, Culver City, CA (US);

Ethan Pratt, Santa Clara, CA (US);

Ricardo Jimenez-Martinez, Culver City, CA (US);

Argyrios Dellis, Plymouth, MN (US);

Kayla Wright-Freeman, Pasadena, CA (US);

Geoffrey Iwata, San Francisco, CA (US);

Michael Romalis, Princeton, NJ (US);

Assignee:

HI LLC, Los Angeles, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/26 (2006.01);
U.S. Cl.
CPC ...
G01R 33/26 (2013.01);
Abstract

A magnetic field measurement system includes a magnetometer having at least one vapor cell, at least one light source to direct at least two light beams through the vapor cell(s), and at least one detector; at least one magnetic field generator to modify an external magnetic field experienced by the vapor cell(s); and at least one processor configured for: applying a first modulation pattern, b(t), to the magnetic field generator(s) to modulate a magnetic field at the vapor cell(s), where b(t)=[ccos(ωt)+ssin(ωt), ccos(ωt)+ssin(ωt), ccos(ωt)+ssin(ωt)], where c, s, c, s, c, and sare amplitudes and ω is a frequency; directing the light source(s) to direct the light beams through the vapor cell(s); receiving signals from the detector(s); and determining three orthogonal components of the external magnetic field using the received signals. Multi-frequency modulation patterns can alternatively be used.


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