The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 2023

Filed:

Dec. 27, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Venkata Sharat Chandra Parimi, Sunnyvale, CA (US);

Satish Radhakrishnan, San Jose, CA (US);

Xiaoquan Min, Cupertino, CA (US);

Sarah Michelle Bobek, Santa Clara, CA (US);

Sungwon Ha, Palo Alto, CA (US);

Prashant Kumar Kulshreshtha, San Jose, CA (US);

Vinay Prabhakar, Cupertino, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/02 (2006.01); C23C 16/26 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32651 (2013.01); C23C 16/26 (2013.01); C23C 16/50 (2013.01); H01J 37/32715 (2013.01); H01L 21/02274 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3323 (2013.01);
Abstract

Exemplary semiconductor processing chambers may include a chamber body including sidewalls and a base. The chambers may include a substrate support extending through the base of the chamber body. The substrate support may include a support platen configured to support a semiconductor substrate. The substrate support may include a shaft coupled with the support platen. The substrate support may include a shield coupled with the shaft of the substrate support. The shield may include a plurality of apertures defined through the shield. The substrate support may include a block seated in an aperture of the shield.


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