The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2023

Filed:

Nov. 15, 2018
Applicant:

Flosfia Inc., Kyoto, JP;

Inventors:

Tokiyoshi Matsuda, Kyoto, JP;

Masahiro Sugimoto, Kyoto, JP;

Takashi Shinohe, Kyoto, JP;

Assignee:

FLOSFIA INC., Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/24 (2006.01); C23C 16/40 (2006.01); H01L 21/02 (2006.01); H01L 21/443 (2006.01); H01L 21/465 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H02M 3/335 (2006.01);
U.S. Cl.
CPC ...
H01L 29/24 (2013.01); C23C 16/40 (2013.01); H01L 21/02565 (2013.01); H01L 21/02631 (2013.01); H01L 21/443 (2013.01); H01L 21/465 (2013.01); H01L 29/063 (2013.01); H01L 29/66969 (2013.01); H01L 29/7806 (2013.01); H01L 29/7813 (2013.01); H02M 3/33576 (2013.01);
Abstract

A semiconductor apparatus capable of reducing the leakage current in the reverse direction, and keeping characteristics thereof, even when using n type semiconductor (gallium oxide, for example) or the like having a low-loss at a high voltage and having much higher dielectric breakdown electric field strength than SiC is provided. A semiconductor apparatus includes a crystalline oxide semiconductor having a corundum structure as a main component, and an electric field shield layer and a gate electrode that are respectively laminated directly or through other layers on the n type semiconductor layer, wherein the electric field shield layer includes a p type oxide semiconductor, and is embedded in the n type semiconductor layer deeper than the gate electrode.


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