The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2023

Filed:

Feb. 14, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Mats Larsson, Sunnyvale, CA (US);

Kevin A. Papke, Portland, OR (US);

Chirag Shaileshbhai Khairnar, Gujarat, IN;

Rajasekhar Patibandla, Bangalore, IN;

Karthikeyan Balaraman, Bangalore, IN;

Balamurugan Ramasamy, Bangalore, IN;

Kartik Shah, Saratoga, CA (US);

Umesh M. Kelkar, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/02 (2006.01); C23C 16/40 (2006.01); C23C 16/56 (2006.01); C23C 16/513 (2006.01); C23C 16/44 (2006.01); C04B 35/18 (2006.01); C04B 35/44 (2006.01); C04B 35/10 (2006.01); C04B 35/20 (2006.01); C04B 35/505 (2006.01); C04B 35/14 (2006.01); C04B 35/04 (2006.01); C04B 35/16 (2006.01); C04B 35/01 (2006.01); C04B 35/195 (2006.01);
U.S. Cl.
CPC ...
C23C 16/0281 (2013.01); C04B 35/01 (2013.01); C04B 35/04 (2013.01); C04B 35/10 (2013.01); C04B 35/14 (2013.01); C04B 35/16 (2013.01); C04B 35/18 (2013.01); C04B 35/195 (2013.01); C04B 35/20 (2013.01); C04B 35/44 (2013.01); C04B 35/505 (2013.01); C23C 16/405 (2013.01); C23C 16/4404 (2013.01); C23C 16/513 (2013.01); C23C 16/56 (2013.01); C04B 2235/96 (2013.01); Y10S 156/914 (2013.01); Y10T 428/1259 (2015.01); Y10T 428/1266 (2015.01); Y10T 428/12597 (2015.01); Y10T 428/12604 (2015.01); Y10T 428/12611 (2015.01); Y10T 428/12667 (2015.01); Y10T 428/12736 (2015.01); Y10T 428/12743 (2015.01); Y10T 428/12764 (2015.01); Y10T 428/1317 (2015.01); Y10T 428/31504 (2015.04); Y10T 428/31678 (2015.04);
Abstract

One embodiment of the disclosure provides a method of fabricating a chamber component with a coating layer disposed on an interface layer with desired film properties. In one embodiment, a method of fabricating a coating material includes providing a base structure comprising an aluminum or silicon containing material, forming an interface layer on the base structure, wherein the interface layer comprises one or more elements from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and forming a coating layer on the interface layer, wherein the coating layer has a molecular structure of SiYMgAlO. In another embodiment, a chamber component includes an interface layer disposed on a base structure, wherein the interface layer is selected from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and a coating layer disposed on the interface layer, wherein the coating layer has a molecular structure of SiYMgAlO.


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