The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2023

Filed:

Feb. 25, 2021
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Takeshi Akimoto, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/305 (2006.01); H01J 37/317 (2006.01); H01J 37/304 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3056 (2013.01); H01J 37/3045 (2013.01); H01J 37/3174 (2013.01); H01J 37/32963 (2013.01); H01J 37/32972 (2013.01); H01J 2237/31744 (2013.01);
Abstract

A substrate processing system includes a substrate processing apparatus and a switching timing creation support device, wherein the switching timing creation support device includes: an acquisition part configured to acquire, for each of a plurality of properties of particles contained in a gas in the substrate processing apparatus during a processing for a substrate, a measured value of an amount of the particles from a measuring device; a selection part configured to select properties of a predetermined number of the particles in descending order of temporal variations in the amount of the particles; a determination part configured to determine an operation expression and a switching condition for determining a switching timing based on a temporal change in the amount of the particles for each of the selected properties of the particles; and an output part configured to output the operation expression and the switching condition to the substrate processing apparatus.


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