The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2023

Filed:

Jul. 17, 2020
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Cheng-Hao Kuo, Hsinchu, TW;

Chia-Lun Chen, Taichung, TW;

Chung-Hao Hu, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 11/13 (2006.01); H01L 21/67 (2006.01); G05D 7/06 (2006.01);
U.S. Cl.
CPC ...
G05D 11/135 (2013.01); G05D 7/0635 (2013.01); G05D 11/138 (2013.01); H01L 21/67023 (2013.01); H01L 21/67017 (2013.01); H01L 21/67253 (2013.01);
Abstract

Semiconductor processing systems and methods are provided in which an amount or concentration of a chemical in a chemical mixture contained in a tank is automatically controlled based on a sensed properties of the chemical mixture. In some embodiments, a semiconductor processing system includes a processing tank that is configured to contain a chemical mixture. A chemical sensor is configured to sense one or more properties of the chemical mixture. The system further includes an electrically controllable valve that is configured to adjust an amount of the first chemical in the chemical mixture based on the sensed one or more properties of the chemical mixture.


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