The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2023
Filed:
Mar. 12, 2020
Avl List Gmbh, Graz, AT;
Klaus Hadl, Graz, AT;
Hannes Noll, Styria, AT;
Mario De Monte, Birkfeld, AT;
Stefan Mannsberger, Graz, AT;
AVL List GmbH, Graz, AT;
Abstract
The invention relates in particular to a method for adjusting the loading () of a particulate filter () and to an assembly designed to carry out the method, wherein the exhaust gas aftertreatment unit () comprises at least two SCR systems () and a particulate filter (), a first operating material amount being introduced in a metered manner before the first SCR system (), and a second operating material amount being introduced in a metered manner before the second SCR system (), the operating material being convertible into a reducing agent. The state of loading of the particulate filter () is determined using a model, and, if the determined state of loading is below a previously defined loading range (), the first operating material amount is adjusted in such a way that the amount of reducing agent is greater than or equal to the amount of reducing agent necessary for nitrogen oxide reduction in accordance with the reaction stoichiometry in the first SCR system (), and/or, if the determined state of loading is above a previously defined loading range (), the first operating material amount is adjusted in such a way that the amount of reducing agent is less than the amount of reducing agent necessary for nitrogen oxide reduction in accordance with the reaction stoichiometry in the first SCR system ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile