The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2023
Filed:
Jun. 15, 2020
Applicant:
Versum Materials Us, Llc, Tempe, AZ (US);
Inventors:
Xinjian Lei, Vista, CA (US);
Meiliang Wang, Carlsbad, CA (US);
Matthew R. MacDonald, Laguna Niguel, CA (US);
Richard Ho, Anaheim, CA (US);
Manchao Xiao, San Diego, CA (US);
Suresh Kalpatu Rajaraman, San Marcos, CA (US);
Assignee:
Versum Materials US, LLC, Tempe, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/40 (2006.01); C09D 1/00 (2006.01); C01B 33/12 (2006.01); C07F 7/02 (2006.01); C07F 7/10 (2006.01);
U.S. Cl.
CPC ...
C09D 1/00 (2013.01); C01B 33/126 (2013.01); C07F 7/025 (2013.01); C07F 7/10 (2013.01); C23C 16/401 (2013.01); C23C 16/402 (2013.01); C23C 16/45527 (2013.01); C23C 16/45536 (2013.01); C23C 16/45542 (2013.01); C23C 16/45553 (2013.01); C01P 2002/54 (2013.01); C01P 2006/10 (2013.01);
Abstract
Described herein are compositions and methods for forming silicon oxide films. In one aspect, the film is deposited from at least one silicon precursor compound, wherein the at least one silicon precursor compound is selected from the following Formulae A and B: as defined herein.