The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Jun. 02, 2017
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

David Masayuki Ishikawa, Mountain View, CA (US);

Brian H. Burrows, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); C04B 35/628 (2006.01); C04B 35/80 (2006.01); C23C 16/04 (2006.01); C23C 16/54 (2006.01); B65H 51/00 (2006.01);
U.S. Cl.
CPC ...
C04B 35/62884 (2013.01); B65H 51/00 (2013.01); C04B 35/62868 (2013.01); C04B 35/62871 (2013.01); C04B 35/80 (2013.01); C23C 16/045 (2013.01); C23C 16/342 (2013.01); C23C 16/345 (2013.01); C23C 16/545 (2013.01); C04B 2235/386 (2013.01); C04B 2235/3873 (2013.01); C04B 2235/5244 (2013.01); C04B 2235/614 (2013.01);
Abstract

Methods and apparatus for depositing material on a continuous substrate are provided herein. In some embodiments, an apparatus for processing a continuous substrate includes: a first chamber having a first volume; a second chamber having a second volume fluidly coupled to the first volume; and a plurality of process chambers, each having a process volume defining a processing path between the first chamber and the second chamber, wherein the process volume of each process chamber is fluidly coupled to each other, to the first volume, and to the second volume, and wherein the first chamber, the second chamber, and the plurality of process chambers are configured to process a continuous substrate that extends from the first chamber, through the plurality of process chambers, and to the second chamber.


Find Patent Forward Citations

Ishikawa, David. (2023). Methods and apparatus for depositing materials on a continuous substrate (U.S. Patent No. 11578004). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11578004

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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