The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Jul. 16, 2020
Applicants:

Qingdao University of Technology, Qingdao, CN;

Qingdao 5d Intelligent Additive Manufacturing Technology Co., Ltd., Qingdao, CN;

Inventors:

Hongbo Lan, Qingdao, CN;

Quan Xu, Qingdao, CN;

Jiawe Zhao, Qingdao, CN;

Xiaoyang Zhu, Qingdao, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); B33Y 10/00 (2015.01); B29C 64/10 (2017.01); B29C 33/38 (2006.01); B29C 59/02 (2006.01); C25D 1/10 (2006.01); F21V 8/00 (2006.01); G03F 7/00 (2006.01); B33Y 50/02 (2015.01); B29C 64/393 (2017.01);
U.S. Cl.
CPC ...
B29D 11/00663 (2013.01); B29C 33/3842 (2013.01); B29C 59/022 (2013.01); B29C 64/10 (2017.08); B29C 64/393 (2017.08); B33Y 10/00 (2014.12); B33Y 50/02 (2014.12); C25D 1/10 (2013.01); G02B 6/0038 (2013.01); G02B 6/0065 (2013.01); G03F 7/0002 (2013.01); B29K 2905/08 (2013.01);
Abstract

A method and apparatus for mass production of AR diffractive waveguides. Low-cost mass production of large-area AR diffractive waveguides (slanted surface-relief gratings) of any shape. Uses two-photon polymerization micro-nano 3D printing to realize manufacturing of slanted grating large-area masters of any shape (thereby solving the problem about manufacturing of slanted grating masters of any shape on the one hand, realizing direct manufacturing of large-size wafer-level masters on the other hand, and also having the advantages of low manufacturing cost and high production efficiency). Composite nanoimprint lithography technology is employed (in combination with the peculiar imprint technique and the composite soft mold suitable for slanted gratings) to solve the problem that a large-slanting-angle large-slot-depth slanted grating cannot be demolded and thus cannot be manufactured, and realize the manufacturing of the slanted grating without constraints (geometric shape and size).


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