The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2023

Filed:

Sep. 04, 2020
Applicant:

Ningbo Semiconductor International Corporation, Ningbo, CN;

Inventor:

Xiaochuan Wang, Shanghai, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H03H 3/02 (2006.01); H03H 9/17 (2006.01); H03H 9/02 (2006.01); H01L 41/277 (2013.01); H03H 9/05 (2006.01);
U.S. Cl.
CPC ...
H03H 3/02 (2013.01); H01L 41/277 (2013.01); H03H 9/02118 (2013.01); H03H 9/0504 (2013.01); H03H 9/171 (2013.01); H03H 9/173 (2013.01); H03H 2003/021 (2013.01); Y10T 29/42 (2015.01); Y10T 29/49005 (2015.01);
Abstract

Methods for forming a film bulk acoustic resonator (FBAR) are provided. In the method, formation of several mutually overlapped and hence connected sacrificial material layers above and under a resonator sheet facilitates the removal of the sacrificial material layers. Cavities left after the removal overlap at a polygonal area with non-parallel sides. This reduces the likelihood of boundary reflections of transverse parasitic waves causing standing wave resonance in the FBAR, thereby enhancing its performance in parasitic wave crosstalk. Further, according to the disclosure, the FBAR is enabled to be integrated with CMOS circuitry and hence exhibits higher reliability.


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