The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2023
Filed:
Apr. 14, 2021
Hua Hong Semiconductor (Wuxi) Limited, Wuxi, CN;
Hua Hong Semiconductor (Wuxi) Limited, Wuxi, CN;
Abstract
A method for making a MOSFET includes forming a gate oxide layer on a substrate; depositing and forming a polysilicon layer on the gate oxide layer; removing the polysilicon layer and the gate oxide layer in a target area by means of dry etching. The remaining gate oxide layer forms a gate oxide of the MOSFET. The remaining polysilicon layer forms a gate of the MOSFET. The method further includes performing LDD implantation on the substrate at both sides of the gate, to form a first LDD area and a second LDD area respectively; and performing SD implantation to form a source and a drain in the substrate at both sides of the gate respectively. Before one of the steps after the depositing and forming a polysilicon layer on the gate oxide layer, fluorine ion implantation is performed.