The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2023
Filed:
Aug. 25, 2021
Duke University, Durham, NC (US);
Krishnendu Chakrabarty, Durham, NC (US);
Sanmitra Banerjee, Durham, NC (US);
DUKE UNIVERSITY, Durham, NC (US);
Abstract
Variation-aware delay fault testing suitable for carbon nanotube field-effect transistor circuits can be accomplished using an electronic design automation tool that performs long path selection by generating random variation scenarios, wherein a random variation scenario (RVS) is an instance of an input netlist where values for a set of process parameters for each gate are chosen from a set of values for each process parameter of the set of process parameters for that gate, the set of values being sampled from a distribution of that particular process parameter for that gate and includes a nominal value for that particular process parameter; calculating a total delay through a path for each RVS; and selecting at least two paths having highest total delays for each fault site under random variations of the RVSs. Delay test patterns can then be generated for the selected paths.