The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2023
Filed:
May. 24, 2016
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Xi Huang, Shanghai, CN;
Fei Peng, San Jose, CA (US);
Kiran Krishnapur, Milpitas, CA (US);
Ruiping Wang, San Jose, CA (US);
Jrjyan Jerry Chen, Campbell, CA (US);
Steven Verhaverbeke, San Francisco, CA (US);
Robert Jan Visser, Menlo Park, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/44 (2006.01); H01L 51/52 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/042 (2013.01); C23C 16/4405 (2013.01); H01L 51/5253 (2013.01); H01L 51/56 (2013.01);
Abstract
A mask assembly () includes a mask frame () and a mask screen (), both of the mask frame () and the mask screen () made of a metallic material, and a metal coating () disposed on exposed surfaces of one or both of the mask frame () and the mask screen ().
Quick Actions:
Huang, Xi. (2023). Shadow mask with plasma resistant coating (U.S. Patent No. 11566322). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11566322
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile