The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2023
Filed:
Mar. 12, 2020
University of Utah Research Foundation, Salt Lake City, UT (US);
Berardi Sensale Rodriguez, Salt Lake City, UT (US);
Ashish Chanana, Salt Lake City, UT (US);
Steven M Blair, Salt Lake City, UT (US);
Vikram Deshpande, Salt Lake City, UT (US);
Michael A Scarpulla, Salt Lake City, UT (US);
Hugo Orlando Condori, Salt Lake City, UT (US);
Jeffrey Walling, Salt Lake City, UT (US);
THE UNIVERSITY OF UTAH RESEARCH FOUNDATION, Salt Lake City, UT (US);
Abstract
Ultra-compact inductor devices for use in integrated circuits (e.g., RF ICs) that use 3-dimensional Dirac materials for providing the inductor. Whereas inductors currently require significant real estate on an integrated circuit, because they require use of an electrically conductive winding around an insulative core, or such metal deposited in a spiral geometry, the present devices can be far more compact, occupying significantly less space on an integrated circuit. For example, an ultra-compact inductor that could be included in an integrated circuit may include a 3-dimensional Dirac material formed into a geometric shape capable of inductance (e.g., as simple as a stripe or series of stripes of such material), deposited on a substantially non-conductive (i.e., insulative) substrate, on which the Dirac material in the selected geometric shape is positioned. Low temperature manufacturing methods compatible with CMOS manufacturing are also provided.