The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2023

Filed:

Jan. 20, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Chen Zhang, Guilderland, NY (US);

Tenko Yamashita, Schenectady, NY (US);

Joshua M. Rubin, Albany, NY (US);

Brent Anderson, Jericho, VT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/092 (2006.01); H01L 29/06 (2006.01); H01L 29/423 (2006.01); H01L 29/49 (2006.01); H01L 29/786 (2006.01); H01L 21/02 (2006.01); H01L 21/8238 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0922 (2013.01); H01L 21/02603 (2013.01); H01L 21/823807 (2013.01); H01L 21/823842 (2013.01); H01L 21/823864 (2013.01); H01L 29/0673 (2013.01); H01L 29/42392 (2013.01); H01L 29/4908 (2013.01); H01L 29/66545 (2013.01); H01L 29/66553 (2013.01); H01L 29/66742 (2013.01); H01L 29/78696 (2013.01);
Abstract

A method comprising forming at least one fin on a substrate, wherein the at least one fin has a first section and a second section. Forming a separating layer on the substrate to isolate the second section of the fin from the first section of the fin. Forming as first set of electrical components on the first section of the at least one fin. Flipping the substrate over and removing the substrate to expose a surface of the second section of the at least one fin. Removing a portion of the second section of the at least one fin, whereby removing a portion of the second section a trench is created between sections of the separating layer and an exposed portion of the at least one fin and forming a hard mask in the trench.


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