The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2023

Filed:

Jul. 21, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Lakmal Charidu Kalutarage, San Jose, CA (US);

Mark Joseph Saly, Milpitas, CA (US);

Bhaskar Jyoti Bhuyan, Milpitas, CA (US);

Thomas Joseph Knisley, Livonia, MI (US);

Kelvin Chan, San Ramon, CA (US);

Regina Germanie Freed, Los Altos, CA (US);

David Michael Thompson, San Jose, CA (US);

Susmit Singha Roy, Sunnyvale, CA (US);

Madhur Sachan, Belmont, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0332 (2013.01); H01L 21/0228 (2013.01); H01L 21/0234 (2013.01); H01L 21/02172 (2013.01); H01L 21/02205 (2013.01); H01L 21/02271 (2013.01); H01L 21/02274 (2013.01);
Abstract

Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method comprises forming a first metal oxo film on the substrate with a first vapor phase process including a first metal precursor vapor and a first oxidant vapor, and forming a second metal oxo film over the first metal oxo film with a second vapor phase process including a second metal precursor vapor and a second oxidant vapor.


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