The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2023
Filed:
Nov. 12, 2021
Applicant:
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, CN;
Inventors:
Peng Li, Shanghai, CN;
Feng Tang, Shanghai, CN;
Xiangzhao Wang, Shanghai, CN;
Yunjun Lu, Shanghai, CN;
Yang Liu, Shanghai, CN;
Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02098 (2022.01);
U.S. Cl.
CPC ...
G01B 9/02098 (2013.01); G01B 2290/50 (2013.01);
Abstract
Method for simultaneously compensating pupil coordinate distortion and shear amount change in a process of wavefront reconstruction in grating transverse shear interference. Where a wavefront is diffracted by a grating, the shapes and light paths of the diffracted wavefronts of all the orders are different, so that on one hand, a coordinate system detected by a detector plane is distorted relative to a pupil coordinate system, and on the other hand, a shear amount changes along with a coordinate position.