The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2023
Filed:
Sep. 20, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Kohei Fukushima, Iwate, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/455 (2006.01); H01L 21/687 (2006.01); C23C 16/458 (2006.01); H01L 21/673 (2006.01); C23C 16/40 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/401 (2013.01); C23C 16/4583 (2013.01); C23C 16/4584 (2013.01); C23C 16/45527 (2013.01); C23C 16/45544 (2013.01); C23C 16/45546 (2013.01); C23C 16/45578 (2013.01); H01L 21/67017 (2013.01); H01L 21/67109 (2013.01); H01L 21/67393 (2013.01); H01L 21/68771 (2013.01);
Abstract
A substrate processing method includes supplying processing gas from a plurality of gas holes formed along a longitudinal direction of an injector, which extends in a vertical direction along an inner wall surface of a processing container and is rotatable around a rotational axis extending in the vertical direction, to perform a predetermined process on a substrate accommodated in the processing container. The predetermined process includes a plurality of operations, and a supply direction of the processing gas is changed by rotating the injector in accordance with the operations.