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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11560626 B1

PDFFull Text
Date of Patent:
Jan. 24, 2023

Filed:

May. 18, 2020

Substrate processing chamber

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Timothy Joseph Franklin, Campbell, CA (US);

Adam Fischbach, Campbell, CA (US);

Edward Haywood, Santa Clara, CA (US);

Abhijit B. Mallick, Fremont, CA (US);

Pramit Manna, Santa Clara, CA (US);

Carlaton Wong, Sunnyvale, CA (US);

Stephen C. Garner, Newark, CA (US);

Eswaranand Venkatasubramanian, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Patterson + Sheridan, LLP

Primary Examiner:

Yuechuan Yu

Int. Cl.
CPC ...
C23C 16/458 (2006.01); H01J 37/32 (2006.01); C23C 16/46 (2006.01); C23C 16/50 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4584 (2013.01); C23C 16/45565 (2013.01); C23C 16/46 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 37/32522 (2013.01); H01J 37/32715 (2013.01); H01J 2237/3321 (2013.01); H01L 21/02115 (2013.01); H01L 21/02274 (2013.01); H01L 21/0332 (2013.01);
Abstract

Embodiments of the present disclosure generally relate to apparatus and methods utilized in the manufacture of semiconductor devices. More particularly, embodiments of the present disclosure relate to a substrate processing chamber, and components thereof, for forming semiconductor devices.

Find Patent Forward Citations

Franklin, Timothy. (2023). Substrate processing chamber (U.S. Patent No. 11560626). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11560626

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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