Integrated circuits containing vertically-integrated capacitor-avalanche diode structures

Abstract

Integrated circuits, such as power amplifier integrated circuits, are disclosed containing compact-footprint, vertically-integrated capacitor-avalanche diode (AD) structures. In embodiments, the integrated circuit includes a semiconductor substrate, a metal layer system, and a vertically-integrated capacitor-AD structure. The metal layer system includes, in turn, a body of dielectric material in which a plurality of patterned metal layers are located. The vertically-integrated capacitor-AD structure includes a first AD formed, at least in part, by patterned portions of the first patterned metal layer. A first metal-insulator-metal (MIM) capacitor is also formed in the metal layer system and at least partially overlaps with the first AD, as taken along a vertical axis orthogonal to the principal surface of the semiconductor substrate. In certain instances, at least a majority, if not the entirety of the first AD vertically overlaps with the first MIM capacitor, by surface area, as taken along the vertical axis.