The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 17, 2023

Filed:

Nov. 18, 2020
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Toshimitsu Sakai, Nirasaki, JP;

Keiko Hada, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); B08B 3/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B08B 3/00 (2013.01); H01L 21/02057 (2013.01);
Abstract

A substrate cleaning apparatus, includes a vaporizer configured to generate water vapor, a first heating part configured to heat a nitrogen gas to a first temperature, a second heating part configured to heat the nitrogen gas to a second temperature, wherein the second temperature is higher than the first temperature, and at least one cleaning chamber connected to the vaporizer, the first heating part, and the second heating part, wherein the at least one cleaning chamber is configured so that at least one substrate is exposed to the water vapor, the nitrogen gas having the first temperature, or the nitrogen gas having the second temperature under an atmospheric pressure.


Find Patent Forward Citations

Sakai, Toshimitsu. (2023). Substrate cleaning apparatus and substrate cleaning method (U.S. Patent No. 11557493). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11557493

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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