The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2023
Filed:
Aug. 14, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Samuel E. Gottheim, Santa Clara, CA (US);
Abhijit B. Mallick, Fremont, CA (US);
Pramit Manna, Santa Clara, CA (US);
Eswaranand Venkatasubramanian, Santa Clara, CA (US);
Timothy Joseph Franklin, Campbell, CA (US);
Edward Haywood, Santa Clara, CA (US);
Stephen C. Garner, Newark, CA (US);
Adam Fischbach, Campbell, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments described herein provide magnetic and electromagnetic housing systems and a method for controlling the properties of plasma generated in a process volume of a process chamber to affect deposition properties of a film. In one embodiment, the method includes rotation of the rotational magnetic housing about a center axis of the process volume to create dynamic magnetic fields. The magnetic fields modify the shape of the plasma, concentration of ions and radicals, and movement of concentration of ions and radicals to control the density profile of the plasma. Controlling the density profile of the plasma tunes the uniformity and properties of a deposited or etched film.