The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 17, 2023

Filed:

Sep. 28, 2018
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Keith Ellis, Carlow, IE;

Giovani Estrada, Dublin, IE;

Michael Nolan, Maynooth, IE;

Niall Cahill, Galway, IE;

David Coates, Leixlip, IE;

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/62 (2022.01); G06N 5/02 (2006.01); G06K 9/00 (2022.01); G06N 20/20 (2019.01);
U.S. Cl.
CPC ...
G06K 9/6282 (2013.01); G06K 9/00 (2013.01); G06K 9/627 (2013.01); G06K 9/6273 (2013.01); G06K 9/6276 (2013.01); G06K 9/6284 (2013.01); G06N 5/022 (2013.01); G06N 20/20 (2019.01);
Abstract

Methods, apparatus, systems and articles of manufacture to improve accuracy of a fog/edge-based classifier system are disclosed. An example apparatus includes a transducer to mounted on a tracked object, the transducer to generate data samples corresponding to the tracked object; a discriminator to: generate a first classification using a first model based on a first calculated feature of the first data samples from the transducer, the first model corresponding to calculated features determined from second data samples, the second data samples obtained prior to the first data samples; generate an offset based on a difference between a first model feature the first model and a second model feature of a second model, the second model being different than the first model; and adjust the first calculated feature using the offset to generate an adjusted feature; a pattern matching engine to generate a second classification using vectors corresponding to the second model based on the adjusted feature; and a counter to, when the first classification matches the second classification, increment a count.


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