The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2023

Filed:

Sep. 30, 2020
Applicant:

Alpha and Omega Semiconductor (Cayman) Ltd., Grand Cayman, KY;

Inventor:

Vipindas Pala, San Jose, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 27/092 (2006.01); H01L 29/16 (2006.01); H01L 21/033 (2006.01); H01L 29/10 (2006.01); H01L 29/08 (2006.01);
U.S. Cl.
CPC ...
H01L 27/092 (2013.01); H01L 21/0337 (2013.01); H01L 29/086 (2013.01); H01L 29/1033 (2013.01); H01L 29/1095 (2013.01); H01L 29/1608 (2013.01); H01L 29/7806 (2013.01);
Abstract

A method for making an integrated device that includes a plurality of planar MOSFETs, includes forming a plurality of doped body regions in an upper portion of a silicon carbide substrate composition and a plurality of doped source regions. A first contact region is formed in a first source region and a second contact region is formed in a second source region. The first and second contact regions are separated by a JFET region that is longer in one planar dimension than the other. The first and second contact regions are separated by the longer planar dimension. The JFET region is bounded on at least one side corresponding to the longer planar dimension by a source region and a body region in conductive contact with at least one contact region.


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