The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2023

Filed:

Nov. 20, 2020
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventors:

Stanley Seungchul Song, San Diego, CA (US);

Bharani Chava, Cork City, IE;

Assignee:

QUALCOMM INCORPORATED, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 25/065 (2006.01); H01L 23/538 (2006.01); H01L 23/00 (2006.01); H01L 25/18 (2006.01); H01L 25/00 (2006.01);
U.S. Cl.
CPC ...
H01L 25/0657 (2013.01); H01L 23/5385 (2013.01); H01L 23/5389 (2013.01); H01L 24/08 (2013.01); H01L 24/09 (2013.01); H01L 25/0652 (2013.01); H01L 25/18 (2013.01); H01L 25/50 (2013.01); H01L 2224/08145 (2013.01); H01L 2224/09181 (2013.01); H01L 2225/06524 (2013.01); H01L 2225/06565 (2013.01);
Abstract

Integrated circuit (IC) packages employing front side back-end-of-line (FS-BEOL) to back side back-end-of-line (BS-BEOL) stacking for three-dimensional (3D) die stacking. To facilitate providing additional electrical routing paths for die-to-die interconnections between stacked IC dice in the IC package, a BS-BEOL metallization structure of a first die of the stacked dice of the IC package is stacked adjacent to a FS-BEOL metallization structure of a second die of the stacked IC dice. Electrical routing paths for die-to-die interconnections between the stacked IC dice are provided from the BS-BEOL metallization structure of the first die to the FS-BEOL metallization structure of the second die. It may be more feasible to form shorter electrical routing paths in the thinner BS-BEOL metallization structure than in a FS-BEM metallization structure for lower-resistance and/or lower-capacitance die-to-die interconnections for faster and/or compatible performance of semiconductor devices in the IC dice.


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