The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2023
Filed:
Jan. 10, 2019
National Technology & Engineering Solutions of Sandia, Llc, Albuquerque, NM (US);
Christian Arrington, Albuquerque, NM (US);
Amber Lynn Dagel, Albuquerque, NM (US);
Jamin Ryan Pillars, Albuquerque, NM (US);
Christopher St. John, Albuquerque, NM (US);
Jonathan Coleman, Albuquerque, NM (US);
Carlos R. Perez, Albuquerque, NM (US);
Andrew E. Hollowell, Albuquerque, NM (US);
Kalin Baca, Albuquerque, NM (US);
National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US);
Abstract
A method is provided for subtractively processing a layer of etchable material formed over an electrically conductive surface region of a workpiece. The workpiece is immersed in a liquid solution, generally but not exclusively a conductive solution, that comprises an etchant for the etchable material, so that etching of the etchable material is initiated. An electric circuit is connected to include a control electrode, a reference electrode, and the electrically conductive surface region of the workpiece. The electric circuit is used to monitor the development process dynamically at each of a plurality of intervals during the etching. The etching is terminated when the electrochemical signal satisfies a criterion indicating that the etching is complete.