The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2022

Filed:

Oct. 16, 2018
Applicant:

King Abdullah University of Science and Technology, Thuwal, SA;

Inventors:

Ming-Hui Chiu, Thuwal, SA;

Hao-Ling Tang, Thuwal, SA;

Lain-Jong Li, Thuwal, SA;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/04 (2006.01); C23C 16/30 (2006.01); C23C 16/46 (2006.01); H01L 31/072 (2012.01); H01L 31/18 (2006.01); H01L 33/00 (2010.01);
U.S. Cl.
CPC ...
H01L 21/02568 (2013.01); C23C 16/04 (2013.01); C23C 16/305 (2013.01); C23C 16/46 (2013.01); H01L 21/0262 (2013.01); H01L 31/072 (2013.01); H01L 31/18 (2013.01); H01L 33/002 (2013.01); H01L 33/005 (2013.01);
Abstract

A method for growing a transition metal dichalcogenide layer involves arranging a substrate having a first transition metal contained pad is arranged in a chemical vapor deposition chamber. A chalcogen contained precursor is arranged upstream of the substrate in the chemical vapor deposition chamber. The chemical vapor deposition chamber is heated for a period of time during which a transition metal dichalcogenides layer, containing transition metal from the first transition metal contained pad and chalcogen from the chalcogen contained precursor, is formed in an area adjacent to the first transition metal contained pad.


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