The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Dec. 19, 2016
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jaeyong Cho, San Jose, CA (US);

Vijay D. Parkhe, San Jose, CA (US);

Haitao Wang, Sunnyvale, CA (US);

Kartik Ramaswamy, San Jose, CA (US);

Chunlei Zhang, Saratoga, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); C23C 16/458 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6833 (2013.01); C23C 16/4586 (2013.01); C23C 16/4587 (2013.01); C23C 16/466 (2013.01); C23C 16/505 (2013.01); H01J 37/32697 (2013.01); H01J 37/32724 (2013.01);
Abstract

An electrostatic chuck is described that has radio frequency coupling suitable for use in high power plasma environments. In some examples, the chuck includes a base plate, a top plate, a first electrode in the top plate proximate the top surface of the top plate to electrostatically grip a workpiece, and a second electrode in the top plate spaced apart from the first electrode, the first and second electrodes being coupled to a power supply to electrostatically charge the first electrode.


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