The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Jul. 01, 2021
Applicant:

United Microelectronics Corp., Hsinchu, TW;

Inventors:

Shu-Ji Chen, Singapore, SG;

Jing Feng, Singapore, SG;

Xiao-Hong Jiang, Singapore, SG;

Ching-Hwa Tey, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 49/02 (2006.01); H01L 21/66 (2006.01); H01L 23/522 (2006.01); H01L 21/67 (2006.01); G01R 27/26 (2006.01); G01R 31/26 (2020.01);
U.S. Cl.
CPC ...
H01L 28/91 (2013.01); G01R 27/2605 (2013.01); G01R 31/2639 (2013.01); H01L 21/67253 (2013.01); H01L 22/12 (2013.01); H01L 22/14 (2013.01); H01L 22/20 (2013.01); H01L 23/5223 (2013.01); H01L 23/5226 (2013.01); H01L 28/40 (2013.01); H01L 28/92 (2013.01);
Abstract

A method for fabricating a MOMCAP includes steps as follows: An Nth metal layer is formed on a substrate according to an Nth expected capacitance value of the Nth metal layer. An Nth capacitance error value between an Nth actual capacitance value of the Nth metal layer and the Nth expected capacitance value is calculated. An N+1th expected capacitance value of an N+1th metal layer is adjusted to form an N+1th actual capacitance value according to the Nth capacitance error value, and the N+1th metal layer with an N+1th actual capacitance value is formed on the Nth metal layer according to the adjusted N+1th expected capacitance value, to make the sum of the Nth actual capacitance value and the N+1th actual capacitance value equal to the sum of the Nth expected capacitance value and the N+1th expected capacitance value. N is an integer greater than 1.


Find Patent Forward Citations

Chen, Shu-Ji. (2022). Method for fabricating metal-oxide-metal capacitor (U.S. Patent No. 11527605). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11527605

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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