The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Dec. 03, 2019
Applied Materials, Inc., Santa Clara, CA (US);
Elizabeth Neville, Saratoga, CA (US);
Satish Radhakrishnan, San Jose, CA (US);
Kartik Shah, Saratoga, CA (US);
Vinay Prabhakar, Cupertino, CA (US);
Venkata Sharat Chandra Parimi, Sunnyvale, CA (US);
Sungwon Ha, Palo Alto, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An example semiconductor processing system may include a chamber body having sidewalls and a base. The processing system may also include a substrate support extending through the base of the chamber body. The substrate support may include a support platen configured to support a semiconductor substrate, and a shaft coupled with the support platen. The processing system may further include a plate coupled with the shaft of the substrate support. The plate may have an emissivity greater than 0.5. In some embodiments, the plate may include a radiation shied disposed proximate the support platen. In some embodiments, the plate may include a pumping plate disposed proximate the base of the chamber body. In some embodiments, the emissivity of the plate may range between about 0.5 and about 0.95.